AURION designed and installed components of CERN and FAIR,
AURION High efficiency RF matching network for all ICP sources in industrial applications
Appropriable for any ICP-sources (Inductively Coupled Plasma): Semiconductor industry plasma etching, RIE and PECVD (Plasma Enhanced Chemical Vapour Deposition) for Flat Panel Displays, Touch Panels, Si3N4 ….
AURION High efficiency RF matching network generates a 20-30% higher efficiency compared with present solutions followed by significantly better coating rates which enable an economic most valuable higher production throughput !
Most flexible and modular plasma vacuum systems
Atmospheric Plasma Innovation
AURION offers workshops for partners and companies in Asia, Africa, America and Europe
at their headquarters and worldwide. Do not hesitate to ask for workshops
and trainings according to your needs. Let us know your demands and questions.
BIOLOGICAL STIMULATION OF THE HUMAN SKIN
APPLYING HEALTH PROMOTING LIGHT AND PLASMA SOURCES
In the frame of BMBF project “BioLiP”, new physical treatment techniques
aiming at medical treatment of the human skin have been developed.
A NOVEL ATMOSPHERIC MICROPLASMA SOURCE
WITH INTEGRATED GAN HEMT MICROWAVE POWER OSCILLATOR
New microplasma source is presented, where the microwave power
is generated by an integrated power oscillator, which is based on a GaN HEMT transistor.
BIOLOGICAL EFFECTS OF NITRIC OXIDE
GENERATED BY AN ATMOSPHERIC PRESSURE GAS-PLASMA ON HUMAN SKIN CELLS
Physical plasmas which contain a mixture of different radicals
have recently found entry in various medical applications.
HIGH EFFICIENCY RF MATCHING NETWORK
FOR ICP SOURCES IN INDUSTRIAL APPLICATIONS
Basics of CCP and ICP,
ICP: H-Mode (inductive) versus C-Mode (capacitive),
Matching network circuits and efficiency,
Experimental: How to distinguish H-/C-mode,
Application in industrial environments
ENERGY EFFICIENT BENDING OF POLYMER TUBES BY DIELECTRIC HEATING
FBH and SRE,
Today used thermal forming methods,
Motivation for the dielectric heating,
Basic principles of the technique introduced here,
Material questions, Comparison of methods,
Introduction of the production solutions
RF WAVEFORM DESIGN BY HARMONIC FREQUENCY SUPERPOSITION
Plasma sheath modelling
by electrical circuit model (Symmetric and Asymmetric)
Waveforming by harmonic superposition
Layout of the RF supply system
Ion energy and electrical potential
Deposition rate and film thickness uniformity
ENERGY EFFICIENT BENDING OF POLYMER TUBES
BY DIELECTRIC HEATING